Ultrashort electron bunches generated with high-intensity lasers: Applications to injectors and x-ray sources

S. Fritzler 1 Kim Ta Phuoc 1 Victor Malka 1 Antoine Rousse 1 E. Lefebvre 2
1 LOA - Laboratoire d'optique appliquée
2 DPTA - Département de Physique Théorique et Appliquée
DAM/DIF - DAM Île-de-France : DAM/DIF
Abstract : The efficiency of the “forced laser wakefield” regime has recently been demonstrated, with the acceleration of electrons up to 200 MeV with a short pulse, 10 Hz laser [V. Malka et al., Science 298, 1596 (2002)]. Numerical simulations presented in this letter provide strong indications that the resulting electron bunches also have very short durations, less than 100 fs. All these features combine to suggest a number of interesting applications for such a source. We discuss its use as a high-energy injector for conventional accelerators, and assess the characteristics of the x-ray pulses that could be obtained via the channelling effect or Thomson scattering with this electron pulse.
Keywords : particle beam bunching electron sources particle beam injection X-ray production wakefield accelerators plasma production by laser
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Journal articles
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https://hal-polytechnique.archives-ouvertes.fr/hal-00517164
Contributor : Thuy Le <>
Submitted on : Monday, September 13, 2010 - 4:33:45 PM
Last modification on : Wednesday, July 3, 2019 - 10:48:02 AM

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S. Fritzler, Kim Ta Phuoc, Victor Malka, Antoine Rousse, E. Lefebvre. Ultrashort electron bunches generated with high-intensity lasers: Applications to injectors and x-ray sources. Applied Physics Letters, American Institute of Physics, 2003, 83 (19), pp.3888. ⟨10.1063/1.1626016⟩. ⟨hal-00517164⟩

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