Ultrashort electron bunches generated with high-intensity lasers: Applications to injectors and x-ray sources - Archive ouverte HAL Access content directly
Journal Articles Applied Physics Letters Year : 2003

Ultrashort electron bunches generated with high-intensity lasers: Applications to injectors and x-ray sources

Abstract

The efficiency of the “forced laser wakefield” regime has recently been demonstrated, with the acceleration of electrons up to 200 MeV with a short pulse, 10 Hz laser [V. Malka et al., Science 298, 1596 (2002)]. Numerical simulations presented in this letter provide strong indications that the resulting electron bunches also have very short durations, less than 100 fs. All these features combine to suggest a number of interesting applications for such a source. We discuss its use as a high-energy injector for conventional accelerators, and assess the characteristics of the x-ray pulses that could be obtained via the channelling effect or Thomson scattering with this electron pulse.
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Dates and versions

hal-00517164 , version 1 (13-09-2010)

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S. Fritzler, Kim Ta Phuoc, Victor Malka, Antoine Rousse, E. Lefebvre. Ultrashort electron bunches generated with high-intensity lasers: Applications to injectors and x-ray sources. Applied Physics Letters, 2003, 83 (19), pp.3888. ⟨10.1063/1.1626016⟩. ⟨hal-00517164⟩
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