Generalized ellipsometry of artificially designed line width roughness - Archive ouverte HAL Access content directly
Journal Articles Thin Solid Films Year : 2011

Generalized ellipsometry of artificially designed line width roughness

(1) , , ,
1
Thomas A. Germer
  • Function : Author
Brent C. Bergner
  • Function : Author
Ronald G. Dixson
  • Function : Author

Abstract

We use azimuthally resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line width roughness (LWR). We model the artificially perturbed grating using one- and two-dimensional rigorous coupled-wave methods in order to evaluate the sensitivity of the experimental spectrally resolved data, measured using a generalized ellipsometer, to the dimensional parameters of LWR. The sensitivity is investigated in the context of multiple conical mounting (azimuth angle) configurations, providing more information about the grating profile.
Not file

Dates and versions

hal-00757371 , version 1 (26-11-2012)

Identifiers

Cite

Martin Foldyna, Thomas A. Germer, Brent C. Bergner, Ronald G. Dixson. Generalized ellipsometry of artificially designed line width roughness. Thin Solid Films, 2011, 519, pp.2633-2636. ⟨10.1016/J.TSF.2010.11.085⟩. ⟨hal-00757371⟩
68 View
0 Download

Altmetric

Share

Gmail Facebook Twitter LinkedIn More