Service interruption on Monday 11 July from 12:30 to 13:00: all the sites of the CCSD (HAL, EpiSciences, SciencesConf, AureHAL) will be inaccessible (network hardware connection).
Skip to Main content Skip to Navigation
Journal articles

Generalized ellipsometry of artificially designed line width roughness

Abstract : We use azimuthally resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line width roughness (LWR). We model the artificially perturbed grating using one- and two-dimensional rigorous coupled-wave methods in order to evaluate the sensitivity of the experimental spectrally resolved data, measured using a generalized ellipsometer, to the dimensional parameters of LWR. The sensitivity is investigated in the context of multiple conical mounting (azimuth angle) configurations, providing more information about the grating profile.
Document type :
Journal articles
Complete list of metadata
Contributor : Martin Foldyna Connect in order to contact the contributor
Submitted on : Monday, November 26, 2012 - 5:02:07 PM
Last modification on : Thursday, March 5, 2020 - 6:26:25 PM




Martin Foldyna, Thomas A. Germer, Brent C. Bergner, Ronald G. Dixson. Generalized ellipsometry of artificially designed line width roughness. Thin Solid Films, Elsevier, 2011, 519, pp.2633-2636. ⟨10.1016/J.TSF.2010.11.085⟩. ⟨hal-00757371⟩



Record views