Effects of Roughness on Scatterometry Signatures

Abstract : We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). Grating profiles were determined from multiple azimuthal configurations, focusing the incident beam into a 60 μm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the perturbed and unperturbed gratings were fit using the same model, and the resulting root-mean-square error (RMSE) values were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER.
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https://hal-polytechnique.archives-ouvertes.fr/hal-00757379
Contributor : Martin Foldyna <>
Submitted on : Monday, November 26, 2012 - 5:11:06 PM
Last modification on : Wednesday, March 27, 2019 - 4:20:04 PM

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M. Foldyna, T. A. Germer, B. C. Bergner. Effects of Roughness on Scatterometry Signatures. FRONTIERS OF CHARACTERIZATION AND METROLOGY FOR NANOELECTRONICS 2011, May 2011, Grenoble, France. pp.49-53, ⟨10.1063/1.3657865⟩. ⟨hal-00757379⟩

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