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Journal articles
Plasma-Texturing Processes and a-Si:H Surface Passivation on c-Si Wafers for Photovoltaic Applications
D. Murias
M. Moreno
1
C. Reyes-Betanzo
A. Torres
2
R. Ambrosio
P. Rosales
José Martinez
I. Vivaldo
P. Roca I Cabarrocas
3
P. Roca I Cabarrocas 3
Author
1
Laboratoire de Chimie Agro-Industrielle (France)
- UT3 - Université Toulouse III - Paul Sabatier (118 route de Narbonne - 31062 Toulouse - France)
- Université Fédérale Toulouse Midi-Pyrénées (41 Allée Jules Guesde, 31000 Toulouse - France)
2
UVa - Universidad de Valladolid [Valladolid] (C/Plaza de Santa Cruz, 8, 47002 Valladolid - Spain)
3
LPICM - Laboratoire de physique des interfaces et des couches minces [Palaiseau] (bat. 408 Route de Saclay 91128 PALAISEAU CEDEX - France)
- X - École polytechnique (École polytechnique, 91128 Palaiseau Cedex - France)
- CNRS - Centre National de la Recherche Scientifique : UMR7647 (France)
Document type :
Journal articles
Domain :
Complete list of metadatas
https://hal-polytechnique.archives-ouvertes.fr/hal-01230433
Contributor : Pere Roca I Cabarrocas <>
Submitted on : Wednesday, November 18, 2015 - 11:59:23 AM
Last modification on : Monday, October 5, 2020 - 12:32:18 PM
Contributor : Pere Roca I Cabarrocas <>
Submitted on : Wednesday, November 18, 2015 - 11:59:23 AM
Last modification on : Monday, October 5, 2020 - 12:32:18 PM
Identifiers
- HAL Id : hal-01230433, version 1
- DOI : 10.1115/1.4031105
Collections
X | CNRS | X-PICM | LPICM | UNIV-PARIS-SACLAY | X-DEP-PHYS | UNIV-TLSE3 | INRAE
Citation
D. Murias, M. Moreno, C. Reyes-Betanzo, A. Torres, R. Ambrosio, et al.. Plasma-Texturing Processes and a-Si:H Surface Passivation on c-Si Wafers for Photovoltaic Applications. Journal of Solar Energy Engineering, American Society of Mechanical Engineers, 2015, 137 (5), ⟨10.1115/1.4031105⟩. ⟨hal-01230433⟩
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