Effect of Wettability on the Agglomeration of Silicon Nanowire Arrays Fabricated by Metal-Assisted Chemical Etching

A. S. Togonal; Lining He; Pere Roca I Cabarrocas

doi:10.1021/la501768f

Journal Articles Langmuir Year : 2014

Effect of Wettability on the Agglomeration of Silicon Nanowire Arrays Fabricated by Metal-Assisted Chemical Etching

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A. S. Togonal

Function : Author

Lining He

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Pere Roca I Cabarrocas

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PersonId : 760063
ORCID : 0000-0003-2241-2762
IdRef : 034125663

Laboratoire de physique des interfaces et des couches minces [Palaiseau]

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Physics [physics]

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https://hal-polytechnique.archives-ouvertes.fr/hal-01230704

Submitted on : Wednesday, November 18, 2015-7:48:28 PM

Last modification on : Wednesday, February 8, 2023-5:10:58 PM

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hal-01230704 , version 1 (18-11-2015)

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HAL Id : hal-01230704 , version 1
DOI : 10.1021/la501768f

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A. S. Togonal, Lining He, Pere Roca I Cabarrocas. Effect of Wettability on the Agglomeration of Silicon Nanowire Arrays Fabricated by Metal-Assisted Chemical Etching. Langmuir, 2014, 30 (34), ⟨10.1021/la501768f⟩. ⟨hal-01230704⟩

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Effect of Wettability on the Agglomeration of Silicon Nanowire Arrays Fabricated by Metal-Assisted Chemical Etching

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