Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry

Aomar Hadjadj 1 Fadila Larbi Mickaël Gilliot 2 Pere Roca I Cabarrocas 3
1 LISM - Laboratoire d'Ingéniérie et Science des Matériaux - EA 4695
2 APC (UMR_7164) - AstroParticule et Cosmologie
3 LPICM - Laboratoire de physique des interfaces et des couches minces [Palaiseau]
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https://hal-polytechnique.archives-ouvertes.fr/hal-01230706
Contributor : Pere Roca I Cabarrocas <>
Submitted on : Wednesday, November 18, 2015 - 7:49:39 PM
Last modification on : Tuesday, December 10, 2019 - 4:58:06 PM

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Aomar Hadjadj, Fadila Larbi, Mickaël Gilliot, Pere Roca I Cabarrocas. Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry. Journal of Chemical Physics, American Institute of Physics, 2014, 141 (8), ⟨10.1063/1.4893558⟩. ⟨hal-01230706⟩

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