Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry - École polytechnique Access content directly
Journal Articles Journal of Chemical Physics Year : 2014
Not file

Dates and versions

hal-01230706 , version 1 (18-11-2015)

Identifiers

Cite

Aomar Hadjadj, Fadila Larbi, Mickaël Gilliot, Pere Roca I Cabarrocas. Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry. Journal of Chemical Physics, 2014, 141 (8), ⟨10.1063/1.4893558⟩. ⟨hal-01230706⟩
163 View
0 Download

Altmetric

Share

Gmail Facebook Twitter LinkedIn More