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Journal Articles Journal of Chemical Physics Year : 2014

Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry

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Submitted on : Wednesday, November 18, 2015-7:49:39 PM

Last modification on : Thursday, May 18, 2023-3:54:07 AM

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hal-01230706 , version 1 (18-11-2015)

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Aomar Hadjadj, Fadila Larbi, Mickaël Gilliot, Pere Roca I Cabarrocas. Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry. Journal of Chemical Physics, 2014, 141 (8), ⟨10.1063/1.4893558⟩. ⟨hal-01230706⟩

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