Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry

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https://hal-polytechnique.archives-ouvertes.fr/hal-01230706
Contributor : Pere Roca I Cabarrocas <>
Submitted on : Wednesday, November 18, 2015 - 7:49:39 PM
Last modification on : Friday, May 10, 2019 - 1:54:12 PM

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Aomar Hadjadj, Fadila Larbi, Mickaël Gilliot, Pere Roca I Cabarrocas. Etching of a-Si:H thin films by hydrogen plasma: A view from in situ spectroscopic ellipsometry. Journal of Chemical Physics, American Institute of Physics, 2014, 141 (8), ⟨10.1063/1.4893558⟩. ⟨hal-01230706⟩

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