Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical properties

Guillaume Fischer; Étienne Drahi; Martin Foldyna; Thomas A. Germer; Erik V. Johnson

doi:10.1364/OE.25.0A1057

Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical properties

Guillaume Fischer ^{1, 2} Étienne Drahi ^{3, 2} Martin Foldyna ¹ Thomas A. Germer ⁴ Erik V. Johnson ¹

1 LPICM - Laboratoire de physique des interfaces et des couches minces [Palaiseau]

2 IPVF - Institut Photovoltaïque d’Ile-de-France

3 Total New Energies R&D Concentrated Solar Technologies

4 NIST - Computer Security Division

Type de document :

Article dans une revue

Optics Express, Optical Society of America, 2017, 25 (24), 〈10.1364/OE.25.0A1057〉

Domaine :

Physique [physics] / Matière Condensée [cond-mat] / Science des matériaux [cond-mat.mtrl-sci]

Liste complète des métadonnées

https://hal-polytechnique.archives-ouvertes.fr/hal-01640105
Contributeur : Martin Foldyna <>
Soumis le : lundi 20 novembre 2017 - 16:52:35
Dernière modification le : jeudi 12 avril 2018 - 01:50:57

Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical properties

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Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical properties

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