Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical properties

Guillaume Fischer; Étienne Drahi; Martin Foldyna; Thomas A. Germer; Erik V. Johnson

doi:10.1364/OE.25.0A1057

Journal articles

Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical properties

Guillaume Fischer ^{1, 2} Étienne Drahi ^{3, 2} Martin Foldyna ¹ Thomas A. Germer ⁴ Erik V. Johnson ¹

1 LPICM - Laboratoire de physique des interfaces et des couches minces [Palaiseau]

2 IPVF - Institut Photovoltaïque d’Ile-de-France (ITE)

3 Total New Energies R&D Concentrated Solar Technologies

4 NIST - Computer Security Division

Document type :

Journal articles

Domain :

Physics [physics] / Condensed Matter [cond-mat] / Materials Science [cond-mat.mtrl-sci]

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https://hal-polytechnique.archives-ouvertes.fr/hal-01640105
Contributor : Martin Foldyna Connect in order to contact the contributor
Submitted on : Monday, November 20, 2017 - 4:52:35 PM
Last modification on : Friday, December 11, 2020 - 12:42:03 PM

Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical properties

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Plasma nanotexturing of silicon surfaces for photovoltaics applications: influence of initial surface finish on the evolution of topographical and optical properties

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