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Maskless and contactless patterned silicon deposition using a localized PECVD process

Abstract : We present a novel technique to perform contactless and mask-free patterned plasma enhanced chemical vapour deposition and etching. When a powered electrode with narrow slits is placed very close to the substrate, plasma is selectively ignited within the slits due to the hollow cathode effect, and so deposition or etching occurs only within an area smaller than the size of the slit. This technique is demonstrated through the deposition of hydrogenated amorphous silicon using a gas mixture of hydrogen, argon and silane. Slits as small as 1 mm generate a plasma, and for this width, the lines deposited are about 750 μm wide, homogenous over their length (60 mm), and are deposited at a rate of 50 nm min −1. The phenomenon is studied using 2D Particle In Cell (PIC) modelling with a simplified argon chemistry. The electron localization observed in the PIC modelling provides an explanation of why the deposition is narrower than the slit.
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https://hal.archives-ouvertes.fr/hal-02545248
Contributor : Tatiana Novikova <>
Submitted on : Monday, November 23, 2020 - 10:03:57 PM
Last modification on : Tuesday, November 24, 2020 - 7:29:14 AM

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Ronan Leal, Bastien Bruneau, Pavel Bulkin, Tatiana Novikova, François Silva, et al.. Maskless and contactless patterned silicon deposition using a localized PECVD process. Plasma Sources Science and Technology, IOP Publishing, 2020, 29 (2), pp.025023. ⟨10.1088/1361-6595/ab5e2c⟩. ⟨hal-02545248⟩

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