Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture

Abstract : We used azimuthally-resolved spectroscopic Mueller matrix ellipsometry to study a periodic silicon line structure with and without artificially-generated line edge roughness (LER). The unperturbed, reference grating profile was determined from multiple azimuthal configurations using a generalized ellipsometer, focusing the incident beam into a 60 μm spot. We used rigorous numerical modeling, taking into account the finite numerical aperture, introducing significant depolarization effects, and determining the profile shape using a four trapezoid model for the line profile. Data obtained from the artificially perturbed grating were then fit using the same model, and the resulting root-mean-square error (RMSE) values for both targets were compared. The comparison shows an increase in RMSE values for the perturbed grating that can be attributed to the effects of LER.
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https://hal-polytechnique.archives-ouvertes.fr/hal-00757380
Contributor : Martin Foldyna <>
Submitted on : Monday, November 26, 2012 - 5:14:47 PM
Last modification on : Wednesday, December 11, 2019 - 11:18:01 AM

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Martin Foldyna, Thomas A. Germer, Brent C. Bergner. Mueller matrix ellipsometry of artificial non-periodic line edge roughness in presence of finite numerical aperture. Conference on Metrology, Inspection, and Process Control for Microlithography XXV, Feb 2011, San Jose, CA, United States. pp.19, ⟨10.1117/12.879518⟩. ⟨hal-00757380⟩

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