Spin memory of the topological material under strong disorder - Archive ouverte HAL Access content directly
Journal Articles Npj Quantum Materials Year : 2020

Spin memory of the topological material under strong disorder

(1) , (1) , (1) , (1) , (1) , (2) , (1) , (3) , (1)
1
2
3

Abstract

Robustness to disorder is the defining property of any topological state. The ultimate disorder limits to topological protection are still unknown, although a number of theories predict that even in the amorphous state a quantized conductance might yet reemerge. Here we report that in strongly disordered thin films of the topological material Sb2Te3 disorder-induced spin correlations dominate transport of charge—they engender a spin memory phenomenon, generated by the nonequilibrium charge currents controlled by localized spins. We directly detect a glassy yet robust disorder-induced magnetic signal in films free of extrinsic magnetic dopants, which becomes null in a lower-disorder crystalline state. This is where large isotropic negative magnetoresistance (MR)—a hallmark of spin memory—crosses over to positive MR, first with only one e2/h quantum conduction channel, in a weakly antilocalized diffusive transport regime with a 2D scaling characteristic of the topological state. A fresh perspective revealed by our findings is that spin memory effect sets a disorder threshold to the protected topological state. It also points to new possibilities of tuning spin-dependent charge transport by disorder engineering of topological materials.
Fichier principal
Vignette du fichier
Spin_memory_final.pdf (3.17 Mo) Télécharger le fichier
Origin : Publisher files allowed on an open archive

Dates and versions

hal-03069948 , version 1 (15-12-2020)

Identifiers

Cite

Inna Korzhovska, Haiming Deng, Lukas Zhao, Yury Deshko, Zhiyi Chen, et al.. Spin memory of the topological material under strong disorder. Npj Quantum Materials, 2020, 5 (1), ⟨10.1038/s41535-020-0241-5⟩. ⟨hal-03069948⟩
46 View
52 Download

Altmetric

Share

Gmail Facebook Twitter LinkedIn More