In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe–Ni alloy substrate for photovoltaic applications
3Department of Physics and Nanotechnology Centre (Department of Physics and Nanotechnology Centre, Technical University of Ostrava, 17. listopadu 15, 708 33 Ostrava-Poruba, Czech Republic - Czech Republic)
https://hal-polytechnique.archives-ouvertes.fr/hal-01230105
Contributor : Martin Foldyna
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Submitted on : Tuesday, November 17, 2015 - 5:45:04 PM
Last modification on : Wednesday, December 11, 2019 - 11:18:03 AM
Z. Mrázková, A. Torres-Rios, R. Ruggeri, M. Foldyna, K. Postava, et al.. In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe–Ni alloy substrate for photovoltaic applications. Thin Solid Films, Elsevier, 2014, 571, ⟨10.1016/j.tsf.2014.06.009⟩. ⟨hal-01230105⟩
