In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe–Ni alloy substrate for photovoltaic applications - Archive ouverte HAL Access content directly
Journal Articles Thin Solid Films Year : 2014

In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe–Ni alloy substrate for photovoltaic applications

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Physics [physics] Physics [physics] Condensed Matter [cond-mat] Materials Science [cond-mat.mtrl-sci]

Martin Foldyna  : Connect in order to contact the contributor

https://hal-polytechnique.archives-ouvertes.fr/hal-01230105

Submitted on : Tuesday, November 17, 2015-5:45:04 PM

Last modification on : Thursday, March 5, 2020-6:31:21 PM

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hal-01230105 , version 1 (17-11-2015)

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Z. Mrázková, A. Torres-Rios, R. Ruggeri, M. Foldyna, K. Postava, et al.. In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe–Ni alloy substrate for photovoltaic applications. Thin Solid Films, 2014, 571, ⟨10.1016/j.tsf.2014.06.009⟩. ⟨hal-01230105⟩

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