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In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe–Ni alloy substrate for photovoltaic applications

Z. Mrázková A. Torres-Rios R. Ruggeri 1 M. Foldyna 2 K. Postava 3 J. Pištora 3 P. Roca I Cabarrocas 2 
1 IMM - Istituto per la Microelettronica e Microsistemi [Catania]
2 LPICM - Laboratoire de physique des interfaces et des couches minces [Palaiseau]
3 Department of Physics and Nanotechnology Centre
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https://hal-polytechnique.archives-ouvertes.fr/hal-01230105
Contributor : Martin Foldyna Connect in order to contact the contributor
Submitted on : Tuesday, November 17, 2015 - 5:45:04 PM
Last modification on : Thursday, March 5, 2020 - 6:31:21 PM

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Z. Mrázková, A. Torres-Rios, R. Ruggeri, M. Foldyna, K. Postava, et al.. In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe–Ni alloy substrate for photovoltaic applications. Thin Solid Films, Elsevier, 2014, 571, ⟨10.1016/j.tsf.2014.06.009⟩. ⟨hal-01230105⟩

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