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In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe–Ni alloy substrate for photovoltaic applications
Z. Mrázková
A. Torres-Rios
R. Ruggeri
1
M. Foldyna
2
K. Postava
3
J. Pištora
3
P. Roca I Cabarrocas
2
Z. Mrázková
Author
A. Torres-Rios
Author
R. Ruggeri 1
Author
M. Foldyna 2
Author IdHAL : martin-foldyna ORCID : https://orcid.org/0000-0001-8413-0504
1
IMM - Istituto per la Microelettronica e Microsistemi [Catania] (Strada VIII, 5 - 95121 Catania - Italy)
- CNR - Consiglio Nazionale delle Ricerche (Piazzale Aldo Moro, 7, 00185 Roma RM - Italy)
2
LPICM - Laboratoire de physique des interfaces et des couches minces [Palaiseau] (bat. 408 Route de Saclay 91128 PALAISEAU CEDEX - France)
- X - École polytechnique (École polytechnique, 91128 Palaiseau Cedex - France)
- CNRS - Centre National de la Recherche Scientifique : UMR7647 (France)
3
Department of Physics and Nanotechnology Centre (Department of Physics and Nanotechnology Centre, Technical University of Ostrava, 17. listopadu 15, 708 33 Ostrava-Poruba, Czech Republic - Czech Republic)
- VSB - Technical University of Ostrava [Ostrava] (17. listopadu 2172/15, 708 00 Ostrava - Czech Republic)
Document type :
Journal articles
Complete list of metadata
https://hal-polytechnique.archives-ouvertes.fr/hal-01230105
Contributor : Martin Foldyna <>
Submitted on : Tuesday, November 17, 2015 - 5:45:04 PM
Last modification on : Thursday, March 5, 2020 - 6:31:21 PM
Contributor : Martin Foldyna <>
Submitted on : Tuesday, November 17, 2015 - 5:45:04 PM
Last modification on : Thursday, March 5, 2020 - 6:31:21 PM
Identifiers
- HAL Id : hal-01230105, version 1
- DOI : 10.1016/j.tsf.2014.06.009
Collections
X | CNRS | X-PICM | LPICM | X-DEP-PHYS
Citation
Z. Mrázková, A. Torres-Rios, R. Ruggeri, M. Foldyna, K. Postava, et al.. In-situ spectroscopic ellipsometry of microcrystalline silicon deposited by plasma-enhanced chemical vapor deposition on flexible Fe–Ni alloy substrate for photovoltaic applications. Thin Solid Films, Elsevier, 2014, 571, ⟨10.1016/j.tsf.2014.06.009⟩. ⟨hal-01230105⟩
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